Objective EC Epiplan-Neofluar 100x/0.9 BD DIC M27
Objective EC Epiplan-Neofluar 100x/0.9 BD DIC M27
Item no.: 422392-9961-000Objective EC Epiplan-Neofluar 100x/0.9 BD DIC M27 (FWD=1.0mm)
Full DescriptionMagnification | 100x |
Numerical Aperture | 0.9 |
Free Working Distance [mm] | 1.0 |
Coverglass Thickness [mm] | 0 |
Thread Type | M27x0.75 |
Immersion | Without Immersion |
Field of View [mm] | 25 |
Parfocal Length [mm] | 45.00 |
Long Distance | |
Correction Ring | |
Iris | |
Optical System | Infinity Color Corrected System (ICS) |
Color Correction | semi-apochromatic |
Biomedical Applications | |
---|---|
Fluorescence | |
- Multichannel | |
- Ultraviolet Transmission | |
- Infra Red Transmission | |
BrightField | |
DIC [Differential Interference Contrast] | |
High Contrast DIC | |
PlasDIC | |
Phase Contrast | |
VAREL Contrast | |
Hoffman Modulation Contrast | |
Polarization Contrast | |
Materials (Reflected Light) Applications | |
BrightField | |
BrightField/DarkField | |
Reflected Light DIC | |
High Contrast DIC | |
DIC with circular polarized light | |
Total Interference Contrast | |
Polarization Contrast | |
Options | |
Definite Focus.2 | |
Confocal Microscopy | |
- Ultra Violet | |
- VIS (visible light) | |
- NLO-IR / 2 Photon | |
Total Internal Reflection Fluorescence | |
Apotome | |
Microdissection |
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DIC slider EC EPN 50x/0.80 and 100x/0.90 HR
Item no.: 000000-1170-901DIC slider EC EPN 50x/0.80 and 100x/0.90 HR
Item no.: 000000-1170-901DIC slider EC EPN 50x/0.80 and 100x/0.90 HR
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DIC slider EC EPN 100x/0.90/50x/0.80 HC/LD EC EPN 100x/0.75
Item no.: 000000-1170-902DIC slider EC EPN 100x/0.90/50x/0.80 HC/LD EC EPN 100x/0.75
Item no.: 000000-1170-902DIC slider EC EPN 100x/0.90/50x/0.80 HC/LD EC EPN 100x/0.75
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Objective ring ACR for objective sleeve conical long
Item no.: 424510-0000-000Objective ring ACR for objective sleeve conical long
Item no.: 424510-0000-000Objective ring ACR for objective sleeve conical long
Note:
All measures in [mm]
mech. Arbeitsabstand = mechanical working distance
Deckglas = cover glass
Objektebene = object plane
Objektfeld = object field
Ausleuchtung = illumination
Probenzugänglichkeit = specimen accessibility
Note:
Please note that due to production tolerances, the given values are typical only and not guaranteed.
This is a series of objectives for the examination of materials. They differ from Epiplan objectives by their higher NA and, accordingly, higher resolving power and like all EC objectives they are optimized for highest contrast. Unlike the Epiplan series, the EC Epiplan-Neofluar series includes 1.25x and 2.5x objectives. These low-power objectives provide maximum object field diameters up to 20 mm. EC Epiplan-Neofluar objectives are also suitable for transmitted-light work. Because of spherical aberration, specimens with cover glass should not be observed with an objective magnification above 20x. There are no restrictions for uncovered specimens. Due to their strict telecentricity on the object side, these objectives are ideal for measuring purposes.They differ from Epiplan objectives by their higher NA and, accordingly, higher resolving power and of course like all EC objectives for highest contrast. Unlike the Epiplan series, the EC Epiplan-Neofluar series includes 1.25x and 2.5x objectives. These low-power objectives provide maximum object field diameters of 20 mm.
EC Epiplan-Neofluar objectives are also suitable for transmitted-light work. Because of spherical aberration, specimens with cover glass should not be observed with objective powers above 20x.
There are no restrictions for uncovered specimens.
Objective EC Epiplan-Neofluar 100x/0.9 BD DIC M27 (FWD=1.0mm)